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CDC solutions control masks and wafer dimensions
( 01 May 2008 )
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• The CDC200, the next generation of Pixer’s high-resolution Critical Dimension Control (CDC) solutions, enables both mask makers and IC manufacturers to control their Critical Dimensions, and significantly improve global and local CD uniformity across masks and wafers.
• These improvements are achieved through the selective modification of the mask transmission profile with partially scattering Shade-In Elements™.
• The tool enables the ITRS roadmap CD uniformity requirements for 45nm and 32nm. Users can realize world-class CD uniformity, with substantial improvements in EOL yield.
• Moreover, the CDC200 improves on the CDC101, providing a more robust production process in a smaller footprint.
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