Parker Hannifin Corporation has released its Parofluor ULTRA material FF370-75. Formulated for high-purity semiconductor processing up to 608°F, the Parofluor ULTRA material FF370-75 is suited for aggressive oxygen and fluorine plasma applications requiring minimal erosions and particle generation. Purity and unique properties of this opaque black, non-filled FFKM minimize potential for particle generation in oxygen- and fluorine-rich plasmas. Through unique compounding techniques, level of ionic contaminants is also minimized. |